Deposition Film Physical Thin Vapor
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Sculptured thin film - Sculptured thin films (STFs) are nanostructured materials with unidirectionally varying properties that can be designed and realized in a controllable manner using variants of physical vapor deposition, a century-old technique. The ability to virtually instantaneously change the growth direction of their columnar morphology, through simple variations in the direction of the incident vapor flux, leads to a wide spectrum of columnar forms.
Physical vapor deposition - Physical vapor deposition (PVD) is a technique used to deposit thin films of various materials onto various surfaces (e.g.
Ion beam assisted deposition - Ion beam assisted deposition or IBAD (not to be confused with ion beam induced deposition, IBID) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. It is especially useful to create a gradual transition between the substrate material and the deposited film, and for depositing films with less built-in strain than is possible by other techniques.
Thin-film deposition - Thin-film deposition is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. "Thin" is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some (molecular beam epitaxy) allow one layer of atoms to be deposited at a time.
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